Microelectronics and semiconductor industry: Titanium target materials are widely used in physical vapor deposition (PVD) technology, and are employed to manufacture interface layers, soldering films and barrier layers in semiconductor devices. These films are crucial for the formation of circuits.

Aerospace field: Due to its high strength and lightweight properties, titanium target materials play a crucial role in the manufacturing of aircraft engine components and fuselage structures.

Medical technology: Titanium materials, due to their excellent biocompatibility, are also used in the manufacturing of medical devices such as artificial joints.
Coating industry: Through physical vapor deposition (PVD) and chemical vapor deposition (CVD) technologies, titanium target materials can be used to produce highly efficient and durable coatings, which can be applied in various fields.

The characteristics of titanium target material
Titanium target materials usually have an extremely high purity (≥ 99.995%), which is crucial for ensuring the quality of the deposited films. Titanium target materials also have the characteristics of low density and high strength, making them perform well in applications with strict weight requirements.
Titanium target materials possess outstanding corrosion resistance, enabling them to remain stable in various harsh environments. Titanium target materials also have excellent biocompatibility and are suitable for the production of medical implants.
The density of high-quality titanium target materials can reach over 99.5%, which helps to enhance the sputtering efficiency and the quality of the film.